Product innovation at the forefront of thin film materials
Heraeus runs two fully equipped Research & Development laboratories for Sputtering Targets: at its Hanau (Germany) and Chandler, Arizona (USA) sites. In addition to these, dedicated product development teams support our various production facilities around the globe.
Short time to market and a close cooperation with our customers is the primary goal of our R&D teams. With a clear focus on the local products, our development activities comprise the following technologies for round, planar and tubular targets.
By combining R & D equipment and production tools, our teams are able to run feasibility tests quickly, while the major development work is usually done full scale to avoid difficulties during up-scaling. While most of the projects utilize in-house tools, we leverage the materials and manufacturing expertise in new areas by closely co-operating with partners and universities in selected technologies.
Technologies
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Melting and casting
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Thermomechanical treatment
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Advanced powder metallurgy
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(CIP, HIP, HP, sintering)
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Thermal spraying
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Bonding
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Thin films
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Sputter Laboratory
Our fully equipped multiple-cathode
sputter laboratory in Hanau enables planar and rotatable cathode tests for immediate feedback on new materials and film properties. In addition, co-development activities with our customers can be supported up to a substrate size of 400x600mm.
Call us for detail.
On-site analytical capabilities are key for fast and full characterization of our materials. Here, the Thin Film Materials Division benefits from the broad materials background at Heraeus. Our on-site laboratories cover:
Laboratories
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Metallography
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Physical characterization
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Density / Hardness / Bending strength / Thermal conductivity / Dilatometer / TGA / DSC / DTA / XRD / EPMA / EBSD / WDX / SEM / EDX / Sputter-Auger
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Chemical characterization
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GDMS / LECO / GDL / ICP / RFA
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