Our R & D department owns a sputtering system. It can be used to test planar and tube targets up to a length of 500 mm.

The system is also designed for double cathode operation and reactive processes and enables complex analyses during the manufacture of coatings, which, for example, are used in photovoltaics, large area coatings and displays.

It is also possible to simulate the use of the target under the customer's production conditions. The system’s capability extends across a wide range from the optimization of newly developed sputtering targets to the development of completely new coating systems.

This leads to significantly shorter development times and therefore facilitates a new level of teamwork with the customer.